STPA1303C

Edwards STPA1303C is a turbomolecular pump designed for use in semiconductor applications. Edwards advanced rotor technology gives class-leading performance for maximum process flexibility. The STPA1303C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.

Informacje

Features and Benefits

  • Advanced rotor technology 

         Maximized process flexibility
         Oil free
         Low vibration
         High reliability
         Maintenance free

  • Advanced controller design 

         Auto tuning
         Self diagnostic functions
         d.c. motor drive
         Battery-free operation

  • Compact design 

         Small footprint
         Half rack controller

Applications

  • Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
  • Electron cyclotron resonance (ECR) etch
  • Film deposition CVD, PECVD, ECRCVD, MOCVD
  • Sputtering
  • Ion implantation source, beam line pumping end station
  • MBE
  • Diffusion
  • Photo resist stripping
  • Crystal/epitaxial growth
  • Wafer inspection
  • Load lock chambers
  • Scientific instruments: surface analysis, mass spectrometry, electron microscopy
  • High energy physics: beam lines, accelerators
  • Radioactive applications: fusion systems, cyclotrons
Dane techniczne
Inlet flange ISO200F
Outlet port KF40
Purge port KF10
Water cooling fitting PT1/4
Pumping Speed  
  N2 1300 ls-1
  H2 800 ls-1
Compression ratio  
  N2 >108
  H2 103
Ultimate pressure with bake out heating 10-7 Pa
  (10-9 Torr)
Maximum continuous outlet pressure * 270 Pa
  (2 Torr)
Maximum Nitrogen throughput * 1500 sccm
Rated speed 32500 rpm
Starting time 7 min
Maximum inlet flange temperature 120 °C
Input voltage 200 to 240 (± 10) V a.c.
Power consumption 0.85 kVA
Pump weight 39 kg
Controller weight 9 kg

* Water cooled

Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure