STPA1603C

The small and powerful Edwards STPA1603C turbo-molecular pump has been designed using Edwards advanced rotor technology. This provides high throughput, maximum reliability and class leading performance which is demanded by the latest generation of semiconductor processes. Its half rack controller and compact design provide considerable space saving, whilst its advanced deposition reduction system gives improved reliability and performance. The STPA1603C has been qualified on the latest 200 mm etch tools as well as on new generation 300 mm oxide etch processes.

Features and Benefits
Advanced rotor design 

•     Increased performance
•     Higher gas throughput
•     High reliability
•     Maintenance free
•     Harsh process compatible

5 Axis Magnetic Suspension System 

•     Zero contamination
•     Low vibration

Corrosion Resistant 

•     Harsh process compatible
•     Increased life

Compact design 

•     Small footprint
•     Half rack controller

Advanced controller design

•     Auto tuning
•     Self diagnostic functions
•     d.c. motor drive
•     Battery-free operation

Applications

• Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
• Electron cyclotron resonance (ECR) etch
• Film deposition CVD, PECVD, ECRCVD, MOCVD
• Sputtering
• Ion implantation source, beam line pumping end station
• MBE
• Diffusion
• Photo resist stripping
• Crystal/epitaxial growth
• Wafer inspection
• Load lock chambers
• Scientific instruments: surface analysis, mass spectrometry, electron microscopy
• High energy physics: beam lines, accelerators
• Radioactive applications: fusion systems, cyclotrons