STPA803C

Edwards STPA803C turbomolecular pump is designed for use in semiconductor applications. Edwards advanced rotor technology gives class-leading performance for maximum process flexibility. The STPA803C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.

Informacje

Features and Benefits
Advanced rotor technology

  •     Maximized process flexibility
  •     Oil free
  •     Low vibration
  •     High reliability
  •     Maintenance free
  •     Harsh process compatible
  •     Increased life

Advanced controller design

  •     Auto tuning
  •     Self diagnostic functions
  •     d.c. motor drive
  •     Battery-free operation

Compact design

  •     Small footprint
  •     Half rack controller


Applications

  •     Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
  •     Electron cyclotron resonance (ECR) etch
  •     Film deposition CVD, PECVD, ECRCVD, MOCVD
  •     Sputtering
  •     Ion implantation source, beam line pumping end station
  •     MBE
  •     Diffusion
  •     Photo resist stripping
  •     Crystal/epitaxial growth
  •     Wafer inspection
  •     Load lock chambers
  •     Scientific instruments: surface analysis, mass spectrometry, electron microscopy
  •     High energy physics: beam lines, accelerators
  •     Radioactive applications: fusion systems, cyclotrons

 

Dane techniczne
Inlet flange ISO160F
Outlet port KF40
Purge port KF10
Water cooling fitting PT1/4
Pumping Speed  
  N2 800 ls-1
  H2 520 ls-1
Compression ratio  
  N2 >108
  H2 103
Ultimate pressure with bake out heating 10-7 Pa (10-9 Torr)
Max continuous outlet pressure 270 Pa (2 Torr)
Max Nitrogen throughput 1500 sccm
Rated speed 32500 rpm
Starting time 7 min
Max inlet flange temperature 120 °C
Input voltage 200 to 240 (± 10) V a.c.
Power consumption 0.85 kVA
Pump weight 39 kg
Controller weight 9 kg
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure