Edwards corrosion resistant STP1003C is a new turbomolecular pump for use in the most advanced of semiconductor applications. Edwards’s rotor technology gives class-leading performance for maximum process flexibility. This pump has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.

Informacje

Features and Benefits

Advanced rotor technology

         Maximized process flexibility
   Oil free
   Low vibration
   High reliability
   Maintenance free
   Harsh process compatible (C version)
   Increased life

Advanced controller design

   Auto tuning
   Self diagnostic functions
   d.c. motor drive
   Battery-free operation

Compact design

Small footprint
Half rack controller

Applications

Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
Electron cyclotron resonance (ECR) etch
Film deposition CVD, PECVD, ECRCVD, MOCVD
Sputtering
Ion implantation source, beam line pumping end station
MBE
Diffusion
Photo resist stripping
Crystal/epitaxial growth
Wafer inspection
Load lock chambers
Scientific instruments: surface analysis, mass spectrometry, electron microscopy
High energy physics: beam lines, accelerators
Radioactive applications: fusion systems, cyclotrons

Dane techniczne

Inlet flange	ISO200F
Outlet port	KF40
Purge port	KF10
Pumping Speed
N₂	1000 ls^-1
H₂	800 ls^-1
Compression ratio
N₂	>10⁸
H₂	>10⁵
Ultimate pressure with bake out heating (VG/ISO flange)	10^-7 Pa
	(10^-9 Torr)
Ultimate pressure with bake out heating (ICF flange)	10^-8 Pa
	(10^-10 Torr)
Max continuous outlet pressure	13 Pa
	(0.1 Torr)
Rated speed	35000 rpm
Starting time	6 min
Max inlet flange temp	120 °C
Input voltage	100 to 120 (± 10) V a.c. or
	to 240 (± 10) V a.c.
Power consumption at Start up	0.8 kVA
Pump weight	31 kg
Controller weight	9 kg

Pliki do pobrania

Edwards Maglev Turbos and the Environment Brochure

Produkty Edwards Vacuum

Pompy Turbomolekularne

STP1003C