STP603
Edwards STP603 is a new turbomolecular pump for use in the most advanced semiconductor applications. Edwards rotor technology gives class-leading performance for maximum process flexibility. This pump has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
Informacje
Features and Benefits
- Advanced rotor technology
Maximized process flexibility
Oil free
Low vibration
High reliability
Maintenance free
- Advanced controller design
Auto tuning
Self diagnostic functions
d.c. motor drive
Battery-free operation
- Compact design
Small footprint
Half rack controller
Applications
- Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
- Electron cyclotron resonance (ECR) etch
- Film deposition CVD, PECVD, ECRCVD, MOCVD
- Sputtering
- Ion implantation source, beam line pumping end station
- MBE
- Diffusion
- Photo resist stripping
- Crystal/epitaxial growth
- Wafer inspection
- Load lock chambers
- Scientific instruments: surface analysis, mass spectrometry, electron microscopy
- High energy physics: beam lines, accelerators
- Radioactive applications: fusion systems, cyclotrons
Dane techniczne
| Inlet flange | ISO160F |
| Outlet port | KF40 |
| Pumping Speed | |
| N2 | 650 ls-1 |
| H2 | 550 ls-1 |
| Compression ratio | |
| N2 | >108 |
| H2 | >105 |
| Ultimate pressure with bake out heating (VG/ISO flange) | 6.5 x 10-6 Pa |
| (5 x 10-8 Torr) | |
| Ultimate Pressure with bake out heating (ICF flange) | 10-7 Pa |
| (10-9 Torr) | |
| Max continuous outlet pressure | 13 Pa (0.1 Torr) |
| Rated speed | 35000 rpm |
| Starting time | 6 min |
| Max inlet flange temp | 120 °C |
| Input voltage | 100 to 120 (± 10) V a.c. or |
| 200 to 240 (± 10) V a.c. | |
| Power consumption at start up | 0.8 kVA |
| Pump weight | 31 kg |
| Controller weight | 9 kg |
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure