STPA1303C
Edwards STPA1303C is a turbomolecular pump designed for use in semiconductor applications. Edwards advanced rotor technology gives class-leading performance for maximum process flexibility. The STPA1303C has been approved for use by major equipment manufacturers in the semiconductor and magnetic media industries.
Informacje
Features and Benefits
- Advanced rotor technology
Maximized process flexibility
Oil free
Low vibration
High reliability
Maintenance free
- Advanced controller design
Auto tuning
Self diagnostic functions
d.c. motor drive
Battery-free operation
- Compact design
Small footprint
Half rack controller
Applications
- Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminum), tungsten and dielectric (oxide) and polysilicon
- Electron cyclotron resonance (ECR) etch
- Film deposition CVD, PECVD, ECRCVD, MOCVD
- Sputtering
- Ion implantation source, beam line pumping end station
- MBE
- Diffusion
- Photo resist stripping
- Crystal/epitaxial growth
- Wafer inspection
- Load lock chambers
- Scientific instruments: surface analysis, mass spectrometry, electron microscopy
- High energy physics: beam lines, accelerators
- Radioactive applications: fusion systems, cyclotrons
Dane techniczne
| Inlet flange | ISO200F |
| Outlet port | KF40 |
| Purge port | KF10 |
| Water cooling fitting | PT1/4 |
| Pumping Speed | |
| N2 | 1300 ls-1 |
| H2 | 800 ls-1 |
| Compression ratio | |
| N2 | >108 |
| H2 | 103 |
| Ultimate pressure with bake out heating | 10-7 Pa |
| (10-9 Torr) | |
| Maximum continuous outlet pressure * | 270 Pa |
| (2 Torr) | |
| Maximum Nitrogen throughput * | 1500 sccm |
| Rated speed | 32500 rpm |
| Starting time | 7 min |
| Maximum inlet flange temperature | 120 °C |
| Input voltage | 200 to 240 (± 10) V a.c. |
| Power consumption | 0.85 kVA |
| Pump weight | 39 kg |
| Controller weight | 9 kg |
* Water cooled
Pliki do pobrania
Edwards Maglev Turbos and the Environment Brochure