Atlas Kronis

Effective exhaust management of CVD processes must be able to handle the deposition gases and the associated powders. The fluoride wastes from cleaning gases also require suitable treatment along with global warming gases. Abatement systems must be able to comply with these requirements in one complete unit.
 
Achieving clean combustion of low k organosilane precursors is challenging, and failure to do so results in unacceptable by-products and blockages in downstream systems. Ultimately such blockages can cause unscheduled downtime. Edwards has gained an in-depth understanding of low k CVD process issues by working extensively with OEMs and materials suppliers during process development.

Features and Benefits

• High performance abatement

        Destroys all low k CVD precursors and clean species simultaneously
        Complete reaction eliminates clogging issues
        Environmental and health and safety compliance assured

• Extensive OEM qualification program
• Low cost of ownership

        Controlled, cost-effective combustion
        Option to run on compressed dry air
        Water recirculation reduces water usage

• Maximised tool uptime

        Excellent handling of high powder volumes
        Field-proven, corrosion-resistant design for chamber cleaning gases
        Supported by Edwards’ global service team for unrivalled field reliability

• Enhanced wafer security

        PLC Controlled, tool interfacing and full system monitoring

• Third-party certification

        SEMI S2, F15 certified, ETL listed

Applications
The Atlas Kronis is suitable for all low k CVD processes using precursors such as:

• Trimethylsilane (3MS)
• Tetramethylsilane (4MS)
• Dimethyldimethoxyorthosilane (DMDMOS)
• Tetramethylcyclotetrasiloxane (TMCTS)
• Octomethylcyclotetrasiloxane (OMCTS)